Paper
25 March 2010 Polymer photochemistry at the EUV wavelength
Theodore H. Fedynyshyn, Russell B. Goodman, Alberto Cabral, Charles Tarrio, Thomas B. Lucatorto
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Abstract
The higher energy associated with extreme ultraviolet (EUV) radiation coupled with the high absorptivity of most organic polymers at these wavelengths should lead to increased excited state population and higher quantum yields of photoproducts. Polymers representative of those commonly employed in resists as well as some model polymers were selected for this study. Polymer photochemistry at EUV was catalogued as to the effect of absorbed 13.4-nm radiation on a polymer's quantum yield of chain scission (Φs) and crosslinking (Φx). In selected cases, the chain scission and crosslinking quantum yields were also compared to those previously determined at 157-, 193- and 248-nm. It was found that quantum yield values were over a magnitude greater at EUV relative to optical wavelengths.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Theodore H. Fedynyshyn, Russell B. Goodman, Alberto Cabral, Charles Tarrio, and Thomas B. Lucatorto "Polymer photochemistry at the EUV wavelength", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76390A (25 March 2010); https://doi.org/10.1117/12.845997
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Cited by 7 scholarly publications.
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KEYWORDS
Polymers

Extreme ultraviolet

Quantum efficiency

Polymer thin films

Extreme ultraviolet lithography

Absorbance

Polymethylmethacrylate

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