Orthogonal lithography for organic electronics

Priscilla G. Taylor; Jin-Kyun Lee; Alexander A. Zakhidov; Ha Soo Hwang; John A. DeFranco; Hon Hang Fong; Margarita Chatzichristidi; Eisuke Murotani; George G. Malliaras; Christopher K. Ober

doi:10.1117/12.848410

29 March 2010 Orthogonal lithography for organic electronics

Priscilla G. Taylor, Jin-Kyun Lee, Alexander A. Zakhidov, Ha Soo Hwang, John A. DeFranco, Hon Hang Fong, Margarita Chatzichristidi, Eisuke Murotani, George G. Malliaras, Christopher K. Ober

Author Affiliations +

Proceedings Volume 7639, Advances in Resist Materials and Processing Technology XXVII; 76390Z (2010) https://doi.org/10.1117/12.848410
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Organic electronics has recently gained attention as a new field promising cheaper, flexible, and large-scale devices. Although photolithography has proven to be a high-resolution and high-throughput patterning method with excellent registration capabilities, the emerging field of organic electronics has been largely unsuccessful in adapting this well-established method as a viable approach to patterning. Chemical compatibility issues between organic materials and the processing solvents and chemicals required by photolithography have been the main problem. This challenge has led us to identify a set of non-damaging processing solvents and to develop alternative imaging materials in order to extend photolithographic patterning methods to organic electronics. We have identified supercritical carbon dioxide and hydrofluoroether (HFE) solvents as chemically benign to organic electronic materials and which are also suitable as processing solvents. We refer to these solvents as orthogonal in that they do not substantially interact with traditional aqueous and organic solvents. Multi-layered devices are easily realized by exploiting this orthogonality property; subsequent layers are deposited and patterned without damaging or otherwise adversely affecting previously deposited underlying layers. We have designed and synthesized novel photoresists, which are processible in these benign solvents.

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Priscilla G. Taylor, Jin-Kyun Lee, Alexander A. Zakhidov, Ha Soo Hwang, John A. DeFranco, Hon Hang Fong, Margarita Chatzichristidi, Eisuke Murotani, George G. Malliaras, and Christopher K. Ober "Orthogonal lithography for organic electronics", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76390Z (29 March 2010); https://doi.org/10.1117/12.848410

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