Dynamics of radical cation of poly(4-hydroxystyrene) generated in thin film upon exposure to electron beam

Kenichiro Natsuda; Takahiro Kozawa; Kazumasa Okamoto; Akinori Saeki; Seiichi Tagawa

doi:10.1117/12.846699

29 March 2010 Dynamics of radical cation of poly(4-hydroxystyrene) generated in thin film upon exposure to electron beam

Kenichiro Natsuda, Takahiro Kozawa, Kazumasa Okamoto, Akinori Saeki, Seiichi Tagawa

Author Affiliations +

Proceedings Volume 7639, Advances in Resist Materials and Processing Technology XXVII; 76391K (2010) https://doi.org/10.1117/12.846699
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

In chemically amplified resists for extreme ultraviolet (EUV) and electron beam (EB) lithographies, the reaction mechanism of acid generation is different from that for photolithography. However, details of acid generation are still unclear. In particularly, details of the deprotonation dynamics of radical cations in solid resist films have not been investigated. The dynamics of radical cations of resist polymer is important for understanding proton generation. Poly(4-hydroxystyrene) (PHS) is a typical polymer for EUV and EB lithographies. We observed the dynamics of PHS radical cation in PHS film by using pulse radiolysis.

Citation Download Citation

Kenichiro Natsuda, Takahiro Kozawa, Kazumasa Okamoto, Akinori Saeki, and Seiichi Tagawa "Dynamics of radical cation of poly(4-hydroxystyrene) generated in thin film upon exposure to electron beam", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76391K (29 March 2010); https://doi.org/10.1117/12.846699

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