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30 March 2010 Improving material-specific dispense processes for low-defect coatings
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Abstract
Minimizing defects in spin-on lithography coatings requires a careful understanding of the interactions between the spin-on coating material and the filtration and dispense system used on the coating track. A wet-developable bottom anti-reflective coating (BARC) was examined for its interaction with polyamide and UPE media when utilizing the Entegris IntelliGen Mini dispense system. In addition, a new method of priming the filter and pump is described which improves the wetting of the filter media, preventing bubbles and other defect-generating air pockets within the system. The goal is to establish plumb-on procedures that are material and hardware specific to avoid any defect problems in the coating process, as well as to gain a better understanding of the chemical and physical interactions that lead to coating defects. Liquid particle counts from a laboratory-based filtration stand are compared with on-wafer defects from a commercial coating track to establish a correlation and allow better prediction of product performance. This comparison in turn will provide valuable insight to the engineering process of product filtration and bottling at the source.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Brian Smith, Raul Ramirez, Jennifer Braggin, Aiwen Wu, Karl Anderson, John Berron, Nick Brakensiek, and Carlton Washburn "Improving material-specific dispense processes for low-defect coatings", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 763929 (30 March 2010); https://doi.org/10.1117/12.846642
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