Development of molecular resists based on Phenyl[4]calixarene derivatives.

Masatoshi Echigo; Hiromi Hayashi; Hiroaki Oizumi; Kazuyuki Matsumaro; Toshiro Itani

doi:10.1117/12.846475

30 March 2010 Development of molecular resists based on Phenyl[4]calixarene derivatives.

Masatoshi Echigo, Hiromi Hayashi, Hiroaki Oizumi, Kazuyuki Matsumaro, Toshiro Itani

Proceedings Volume 7639, Advances in Resist Materials and Processing Technology XXVII; 76392B (2010) https://doi.org/10.1117/12.846475
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

We have developed negative-tone molecular resist based on C-4-cyclohexylphenylcalix[4]resorcinarene(MGR108) and positive-tone molecular resist based on protected C-4-isopropylphenylcalix[4]resorcinarene (MGR104P). Both MGR108 and MGR104P showed high solubility in both conventional resist solvents such as propylene glycol monomethyl ether and conventional alkaline developer of 0.26N TMAHaq. In this paper, we show current performance of resists by EB lithography (EBL) and EUV lithography (EUVL).

Citation Download Citation

Masatoshi Echigo, Hiromi Hayashi, Hiroaki Oizumi, Kazuyuki Matsumaro, and Toshiro Itani "Development of molecular resists based on Phenyl[4]calixarene derivatives.", Proc. SPIE 7639, Advances in Resist Materials and Processing Technology XXVII, 76392B (30 March 2010); https://doi.org/10.1117/12.846475

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