Tolerancing analysis of customized illumination for practical applications of source and mask optimization

Tomoyuki Matsuyama; Naonori Kita; Toshiharu Nakashima; Osamu Tanitsu; Soichi Owa

doi:10.1117/12.846639

3 March 2010 Tolerancing analysis of customized illumination for practical applications of source and mask optimization

Tomoyuki Matsuyama, Naonori Kita, Toshiharu Nakashima, Osamu Tanitsu, Soichi Owa

Proceedings Volume 7640, Optical Microlithography XXIII; 764007 (2010) https://doi.org/10.1117/12.846639
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Due to the extremely small process window in the 32nm feature generation and beyond, it is necessary to implement active techniques that can expand the process window and robustness of the imaging against various kinds of imaging parameters. Source & Mask Optimization (SMO) 1 is a promising candidate for such techniques. Although many applications of SMO are expected, tolerancing and specifications for aggressively customized illuminators have not been discussed yet. In this paper we are going to study tolerancing of a freeform pupilgram which is a solution of SMO. We propose Zernike intensity/distortion modulation method to express pupilgram errors. This method may be effective for tolerancing analysis and defining the specifications for freeform illumination. Furthermore, this method is can be applied to OPE matching of free form illumination source.

Citation Download Citation

Tomoyuki Matsuyama, Naonori Kita, Toshiharu Nakashima, Osamu Tanitsu, and Soichi Owa "Tolerancing analysis of customized illumination for practical applications of source and mask optimization", Proc. SPIE 7640, Optical Microlithography XXIII, 764007 (3 March 2010); https://doi.org/10.1117/12.846639

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