Performance of FlexRay: a fully programmable illumination system for generation of freeform sources on high NA immersion systems

Melchior Mulder; André Engelen; Oscar Noordman; Gert Streutker; Bert van Drieenhuizen; Cas van Nuenen; Wilfred Endendijk; Jef Verbeeck; Wim Bouman; Anita Bouma; Robert Kazinczi; Robert Socha; Dirk Jürgens; Joerg Zimmermann; Bastian Trauter; Joost Bekaert; Bart Laenens; Daniel Corliss; Greg McIntyre

doi:10.1117/12.845984

3 March 2010 Performance of FlexRay: a fully programmable illumination system for generation of freeform sources on high NA immersion systems

Melchior Mulder, André Engelen, Oscar Noordman, Gert Streutker, Bert van Drieenhuizen, Cas van Nuenen, Wilfred Endendijk, Jef Verbeeck, Wim Bouman, Anita Bouma, Robert Kazinczi, Robert Socha, Dirk Jürgens, Joerg Zimmermann, Bastian Trauter, Joost Bekaert, Bart Laenens, Daniel Corliss, Greg McIntyre

Author Affiliations +

Proceedings Volume 7640, Optical Microlithography XXIII; 76401P (2010) https://doi.org/10.1117/12.845984
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

This paper describes the principle and performance of FlexRay, a fully programmable illuminator for high NA immersion systems. Sources can be generated on demand, by manipulating an array of mirrors instead of the traditional way of inserting optical elements and changing lens positions. On demand (freeform) source availability allows for reduction in R&D cycle time and shrink in k1. Unlimited tuning allows for better machine to machine matching. FlexRay has been integrated in a 1.35NA TWINSCAN exposure system. We will present data of FlexRay using measured traditional and freeform illumination sources. In addition system performance qualification data on stability, reproducibility and imaging will be shown. The benefit of FlexRay for SMO enabling shrink is demonstrated using an SRAM example.

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Melchior Mulder, André Engelen, Oscar Noordman, Gert Streutker, Bert van Drieenhuizen, Cas van Nuenen, Wilfred Endendijk, Jef Verbeeck, Wim Bouman, Anita Bouma, Robert Kazinczi, Robert Socha, Dirk Jürgens, Joerg Zimmermann, Bastian Trauter, Joost Bekaert, Bart Laenens, Daniel Corliss, and Greg McIntyre "Performance of FlexRay: a fully programmable illumination system for generation of freeform sources on high NA immersion systems", Proc. SPIE 7640, Optical Microlithography XXIII, 76401P (3 March 2010); https://doi.org/10.1117/12.845984

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