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22 March 2010Comparison of OPC models with and without
3D-mask effect
OPC models with and without thick mask effect (3D-mask effect) are compared in their prediction capabilities of actual
2D patterns. We give some examples in which thin-mask models fail to compensate the 3D-mask effect. The models
without 3D-mask effect show good model residual error, but fail to predict some critical CD tendencies. Rigorous
simulation predicts the observed CD tendencies, which confirms that the discrepancy really comes from 3D-mask effect.
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Jung-Hoon Ser, Tae-Hoon Park, Moon-Gyu Jeong, Eun-Mi Lee, Sung-Woo Lee, Chun-Suk Suh, Seong-Woon Choi, Chan-Hoon Park, Joo-Tae Moon, "Comparison of OPC models with and without 3D-mask effect," Proc. SPIE 7640, Optical Microlithography XXIII, 76401T (22 March 2010); https://doi.org/10.1117/12.848317