Topography-aware BARC optimization for double patterning

Shijie Liu; Tim Fühner; Feng Shao; Aliaksandr Barenbaum; Johannes Jahn; Andreas Erdmann

doi:10.1117/12.846441

10 March 2010 Topography-aware BARC optimization for double patterning

Shijie Liu, Tim Fühner, Feng Shao, Aliaksandr Barenbaum, Johannes Jahn, Andreas Erdmann

Proceedings Volume 7640, Optical Microlithography XXIII; 76403C (2010) https://doi.org/10.1117/12.846441
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

This paper aims at identifying appropriate bottom anti-reflective coatings (BARCs) for double patterning techniques such as Litho-Freeze-Litho-Etch (LFLE). A short introduction into the employed optimization methodology, including variables, figures of merit, models and optimization algorithms is given. A study on the impact of a refractive index modulation caused by the first lithographic step is presented. Several optimization surveys taking the index modulation into account are set forth, and the results are discussed. In addition to optimization procedures aiming at optimizing one litho step at a time, a co-optimization study for both litho steps is proposed. Finally, two multi-objective optimization procedures that allow for a post-optimization exploration and selection of optimum solutions are presented. Numerous solutions are discussed in terms of their anti-reflectance behavior and their manufacturing feasibility.

Citation Download Citation

Shijie Liu, Tim Fühner, Feng Shao, Aliaksandr Barenbaum, Johannes Jahn, and Andreas Erdmann "Topography-aware BARC optimization for double patterning", Proc. SPIE 7640, Optical Microlithography XXIII, 76403C (10 March 2010); https://doi.org/10.1117/12.846441

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