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9 April 2010 Nano-silicon based photonic crystal stamps with electron beam lithography (EBL) technology
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Abstract
We report on using e-beam lithographically technology for enabling the mass replication of custom-designed and prepared Nano-structures via establishing nanoimprint processes for pattern transfer into UV curable prepolymes. By EBL, the new nano-fabrication technology based on the concept of disposal master technology (DMT) is suitable for mass volume manufacturing of large area arrays of sub-wavelength photonic elements. We will present some kinds of PhC and waveguides for fabrication of nanoimprint Electron beam lithography stamps.
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Reyhaneh Jannesari, Iris Bergmair, Saeid Zamiri, and Kurt Hingerl "Nano-silicon based photonic crystal stamps with electron beam lithography (EBL) technology", Proc. SPIE 7643, Active and Passive Smart Structures and Integrated Systems 2010, 76431X (9 April 2010); https://doi.org/10.1117/12.848497
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