Comprehensive design and process flow configuration for micro and nano tech devices

Kai Hahn; Thilo Schmidt; Matthias Mielke; Dirk Ortloff; Jens Popp; Rainer Brück

doi:10.1117/12.847583

30 March 2010 Comprehensive design and process flow configuration for micro and nano tech devices

Kai Hahn, Thilo Schmidt, Matthias Mielke, Dirk Ortloff, Jens Popp, Rainer Brück

Proceedings Volume 7646, Nanosensors, Biosensors, and Info-Tech Sensors and Systems 2010; 76461F (2010) https://doi.org/10.1117/12.847583
Event: SPIE Smart Structures and Materials + Nondestructive Evaluation and Health Monitoring, 2010, San Diego, California, United States

Abstract

The development of micro and nano tech devices based on semiconductor manufacturing processes comprises the structural design as well as the definition of the manufacturing process flow. The approach is characterized by application specific fabrication flows, i.e. fabrication processes (built up by a large variety of process steps and materials) depending on the later product. Technology constraints have a great impact on the device design and vice-versa. In this paper we introduce a comprehensive methodology and based on that an environment for customer-oriented product engineering of MEMS products. The development is currently carried out in an international multi-site research project.

Citation Download Citation

Kai Hahn, Thilo Schmidt, Matthias Mielke, Dirk Ortloff, Jens Popp, and Rainer Brück "Comprehensive design and process flow configuration for micro and nano tech devices", Proc. SPIE 7646, Nanosensors, Biosensors, and Info-Tech Sensors and Systems 2010, 76461F (30 March 2010); https://doi.org/10.1117/12.847583

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