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6 October 2010 Theoretical analysis and experimental study of material removal characteristics in ion beam figuring process
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Proceedings Volume 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 76550X (2010) https://doi.org/10.1117/12.866969
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China
Abstract
Based on the Sigmund sputtering theory, the material removal characteristics in ion beam figuring process are analyzed. The analysis shows that the footprint of beam removal function and the removal rate vary with different incidence angles, which is validated by experiments on small fused silica samples. These material removal characteristics are valuable in ion beam figuring process, which could be applied to machining spherical surfaces and aspherical surfaces with simple method.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yifan Dai, Wenlin Liao, Shanyong Chen, Lin Zhou, and Xuhui Xie "Theoretical analysis and experimental study of material removal characteristics in ion beam figuring process", Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 76550X (6 October 2010); https://doi.org/10.1117/12.866969
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