Optical and mechanical properties of nanocrystalline silicon dioxide films prepared by medium frequency magnetron sputtering

Y. Z. Cao; Z. J. Hu; F. L. Yu; T. Sun; S. Dong

doi:10.1117/12.866244

6 October 2010 Optical and mechanical properties of nanocrystalline silicon dioxide films prepared by medium frequency magnetron sputtering

Y. Z. Cao, Z. J. Hu, F. L. Yu, T. Sun, S. Dong

Author Affiliations +

Proceedings Volume 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 76552G (2010) https://doi.org/10.1117/12.866244
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China

Abstract

Nanocrystalline silicon dioxide (SiO₂) films were prepared on aluminium substrates using medium frequency magnetron sputtering. The surface morphology of SiO₂ film on aluminium substrate was observed using atomic force microscopy. The nanohardness and the elastic modulus of the SiO₂ film-aluminium system were measured by a nanoindentation technique. Moreover, optical propertie of SiO₂ film-aluminium system was investigated. It was found that the composition of silicon dioxide films varies from nearly pure Si, SiO to SiO₂, controlled by O₂ flow rate. The reflection index of nanocrystalline SiO₂ film-aluminium system is accord with the mixture rule. All SiO₂ films are transparent and the transmittance increases with increasing O₂ concentration.

Citation Download Citation

Y. Z. Cao, Z. J. Hu, F. L. Yu, T. Sun, and S. Dong "Optical and mechanical properties of nanocrystalline silicon dioxide films prepared by medium frequency magnetron sputtering", Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 76552G (6 October 2010); https://doi.org/10.1117/12.866244

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