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6 October 2010 Optical and mechanical properties of nanocrystalline silicon dioxide films prepared by medium frequency magnetron sputtering
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Proceedings Volume 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 76552G (2010) https://doi.org/10.1117/12.866244
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China
Abstract
Nanocrystalline silicon dioxide (SiO2) films were prepared on aluminium substrates using medium frequency magnetron sputtering. The surface morphology of SiO2 film on aluminium substrate was observed using atomic force microscopy. The nanohardness and the elastic modulus of the SiO2 film-aluminium system were measured by a nanoindentation technique. Moreover, optical propertie of SiO2 film-aluminium system was investigated. It was found that the composition of silicon dioxide films varies from nearly pure Si, SiO to SiO2, controlled by O2 flow rate. The reflection index of nanocrystalline SiO2 film-aluminium system is accord with the mixture rule. All SiO2 films are transparent and the transmittance increases with increasing O2 concentration.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Y. Z. Cao, Z. J. Hu, F. L. Yu, T. Sun, and S. Dong "Optical and mechanical properties of nanocrystalline silicon dioxide films prepared by medium frequency magnetron sputtering", Proc. SPIE 7655, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 76552G (6 October 2010); https://doi.org/10.1117/12.866244
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