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22 October 2010 Design and analysis of deep ultraviolet microlithography illumination system
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To achieve high uniformity in large area on the mask of deep ultraviolet micro-lithography lens, a deep study of DUV micro-lithography illumination system is expanded in both theoretical and experimental aspects in this paper. Characters of different illumination structures and mode are introduced. Then an applicable illumination mode according to the requirements is selected. At the same time, two kinds of removing the uneven illumination ways--fly-eyes and optical tunnel are studied. After that, according to the large numerical aperture requirement, a refractive illumination system is designed with software ZEMAX. In this system, methods are used to reduce the number of the aspherical mirrors. The system is optimized to meet the requirement of large illumination area on the mask. Then by using the software of TracePro, the optimized system modeling and calculate illuminance on image plane are created and the uniformity of the image plane is analysised. The result shows that the uniformity of the image plane and the size of light spot basically satisfied the requirements, and having great feasibility in DUV micro-lithography illumination system.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xing Han, Lin Li, Yifan Huang, Baolin Du, Bin Ma, and Zihui Che "Design and analysis of deep ultraviolet microlithography illumination system", Proc. SPIE 7657, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 765715 (22 October 2010);

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