Nano-optical microscopy: now and its industrialization

Shifa Wu; Zhao Wang; Jian Zhang; Chenbiao Xu; Hong Li; Shi Pan

doi:10.1117/12.867697

28 October 2010 Nano-optical microscopy: now and its industrialization

Shifa Wu, Zhao Wang, Jian Zhang, Chenbiao Xu, Hong Li, Shi Pan

Proceedings Volume 7658, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology; 76580O (2010) https://doi.org/10.1117/12.867697
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China

Abstract

It is a review about the industrialization of Nano-Optical Microscope (NOM, also referred to as the Near-field Optical Microscope). Two comparisons of AF/PSTM (Transmission Mode) with the first generation commercial A-SNOM and AF/RNOM(Reflective Mode) with A-RNOM have discussed. The commercially used A-SNOM can only obtain a transmissivity image of A-SNOM-T(x,y), but AF/PSTM can obtain the separating the transmissivity image PSTM-T(x,y) and the refractive index imge PSTM-n₁(x,y). AF/RNOM can obtain the lower contrast reflective index image but ARNOM cannot. The reason how could Pohl have obtained the first A-SNOM image with a resolution of 20-25nm in 1984 but the commercial A-SNOM-T(x,y) only with the resolution in the 50~100nm range is also discussed. Conclusion on the proposal of AF/PSTM and combined AF/RNOM may be the best candidate for the second generation commercial use of NOM.

Citation Download Citation

Shifa Wu, Zhao Wang, Jian Zhang, Chenbiao Xu, Hong Li, and Shi Pan "Nano-optical microscopy: now and its industrialization", Proc. SPIE 7658, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology, 76580O (28 October 2010); https://doi.org/10.1117/12.867697

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