Study on the dependence of properties of TiOx heat sensitive films on deposit oxygen flow rate

Jing Jiang; Zhiming Wu; Yonglong Qiu; He Yu; Yadong Jiang

doi:10.1117/12.865557

22 October 2010 Study on the dependence of properties of TiOx heat sensitive films on deposit oxygen flow rate

Jing Jiang, Zhiming Wu, Yonglong Qiu, He Yu, Yadong Jiang

Proceedings Volume 7658, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology; 76583J (2010) https://doi.org/10.1117/12.865557
Event: 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2010, Dalian, China

Abstract

In this article, titanium oxide thin films (TiOx) are prepared with the reactive DC sputtering in an oxygen and argon atmosphere. Properties of titanium oxide films could be largely varied by controlling the deposition condition. Here we study on the dependence of sheet resistance, thickness, optical transmittance and film composition of titanium oxide films on different deposit oxygen flow rates.

Citation Download Citation

Jing Jiang, Zhiming Wu, Yonglong Qiu, He Yu, and Yadong Jiang "Study on the dependence of properties of TiOx heat sensitive films on deposit oxygen flow rate", Proc. SPIE 7658, 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Detector, Imager, Display, and Energy Conversion Technology, 76583J (22 October 2010); https://doi.org/10.1117/12.865557

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