Fabrication of wavelength selective germanium dielectric supported microbolometers

Jong Yeon Park; Joo-Yun Jung; Dean P. Neikirk; Aniruddha S. Weling; William T. Hafer; James H. Goldie; Paul Wilson

doi:10.1117/12.850456

3 May 2010 Fabrication of wavelength selective germanium dielectric supported microbolometers

Jong Yeon Park, Joo-Yun Jung, Dean P. Neikirk, Aniruddha S. Weling, William T. Hafer, James H. Goldie, Paul Wilson

Proceedings Volume 7660, Infrared Technology and Applications XXXVI; 76601C (2010) https://doi.org/10.1117/12.850456
Event: SPIE Defense, Security, and Sensing, 2010, Orlando, Florida, United States

Abstract

This paper describes the microfabrication process and characterization of wavelength selective germanium dielectric supported microbolometers, which should be compatible with standard microbolometer fabrication processes. Here we have demonstrated a micro fabricated robust germanium dielectric structure layer that replaces the usual silicon nitride structural layer in microbolometers. The fabricated microbolometers consist of a chromium resistive sheet as an absorber layer above an air-gap/germanium dielectric structure.

Citation Download Citation

Jong Yeon Park, Joo-Yun Jung, Dean P. Neikirk, Aniruddha S. Weling, William T. Hafer, James H. Goldie, and Paul Wilson "Fabrication of wavelength selective germanium dielectric supported microbolometers", Proc. SPIE 7660, Infrared Technology and Applications XXXVI, 76601C (3 May 2010); https://doi.org/10.1117/12.850456

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