Chemical Factors Affecting Npr Performance

R. G. Tarascon; J. Frackoviak; E. Reichmanis; L. F. Thompson

doi:10.1117/12.940308

25 August 1987 Chemical Factors Affecting Npr Performance

R. G. Tarascon, J. Frackoviak, E. Reichmanis, L. F. Thompson

Proceedings Volume 0771, Advances in Resist Technology and Processing IV; (1987) https://doi.org/10.1117/12.940308
Event: Microlithography Conferences, 1987, Santa Clara, CA, United States

Abstract

NPR, a material consisting of a novolac resin blended with poly(2-methyl-l-pentene sulfone) (PMPS), is an attractive positive electron beam resist. However, it exhibited a number of problems during processing. For example after the development step, NPR patterns were surrounded by a halo due to resist thickness differences in the region next to the exposed areas. Also, a thin residual film appeared in the developed regions. A study of these problems showed that immiscibility between the two NPR components was responsible for many of the results. Also, Fourier Transform Infra Red Spectroscopy showed that a low molecular weight PMPS, [n] - 20 cm3/g, considerably improved compatibility and reduced the defects mentioned above. For this reason a study of PMPS molecular parameters by Gel Permeation Chromatography (GPC), light scattering and intrinsic viscosity was undertaken. This study related the molecular variables to synthetic conditions and a reproducible synthesis was established. A new NPR system was prepared with 9% low molecular weight sulfone polymer. This resist exhibits good film quality after development and displays a sensitivity of 8pC/cm2 with excellent (0.25μm) resolution.

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R. G. Tarascon, J. Frackoviak, E. Reichmanis, and L. F. Thompson "Chemical Factors Affecting Npr Performance", Proc. SPIE 0771, Advances in Resist Technology and Processing IV, (25 August 1987); https://doi.org/10.1117/12.940308

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