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13 May 2010 Fabrication of three-dimensional metallodielectric photonic crystals by interference lithography
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Abstract
We report on the fabrication of metallodielectric photonic crystals by means of interference (or holographic) lithography and subsequent coating by gold nanoparticles. The grating is realized in a SU-8 photoresist using a He-Cd laser of wavelength 442 nm. The use of the wavelength found within the photoresist low absorption band enables fabricating structures that are uniform in depth. Parameters of the photoresist exposure and development for obtaining a porous structure corresponding to an orthorhombic lattice are determined. Coating of photonic crystals by gold nanoparticles is realized by reduction of chloroauric acid by a number of reductants in a water solution. This research shows that the combination of interference lithography and chemical coating by metal is attractive for the fabrication of metallodielectric photonic crystals.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. N. Dyachenko, S. V. Karpeev, E. V. Fesik, Yu. V. Miklyaev, V. S. Pavelyev, and G. D. Malchikov "Fabrication of three-dimensional metallodielectric photonic crystals by interference lithography", Proc. SPIE 7713, Photonic Crystal Materials and Devices IX, 77131J (13 May 2010); https://doi.org/10.1117/12.853791
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