In situ control of roughness of processed surfaces by reflectometric method

Yuriy D. Filatov; Oleksandr Yu. Filatov; Uwe Heisel; Michael Storchak; Guy Monteil

doi:10.1117/12.854949

14 May 2010 In situ control of roughness of processed surfaces by reflectometric method

Yuriy D. Filatov, Oleksandr Yu. Filatov, Uwe Heisel, Michael Storchak, Guy Monteil

Proceedings Volume 7718, Optical Micro- and Nanometrology III; 77181J (2010) https://doi.org/10.1117/12.854949
Event: SPIE Photonics Europe, 2010, Brussels, Belgium

Abstract

It is demonstrated that the removal rate in polishing optic materials decreases exponentially with increasing bond energy in these materials and the polished surface roughness depends on the ratio of natural frequencies of molecular fragments on the tool and workpiece surfaces. The dependences of polished surface roughness on the slime particle size, permit an optimal choice of powders for a bound-abrasive polishing tools, which will ensure a required polished surface quality. The dependences of the polished surface microprofile parameters on the coordinate of a zone under study, which were described by periodic functions, do represent the effects that occur in the tool-workpiece contact zone. The optical monitoring system, the device for giving of the technological environment in a zone of contact of the tool and a processed detail and a technique of adjustment of the machine tool for finishing processing of precision optic surfaces are described. The relation of intensity of the beam reflected from a surface, to intensity of a falling beam allows to estimate a reflexion index in situ. Increase of reflexion index in process of roughness decrease is established. Possibility of active quality assurance of precision surfaces in the course of processing is shown.

Citation Download Citation

Yuriy D. Filatov, Oleksandr Yu. Filatov, Uwe Heisel, Michael Storchak, and Guy Monteil "In situ control of roughness of processed surfaces by reflectometric method", Proc. SPIE 7718, Optical Micro- and Nanometrology III, 77181J (14 May 2010); https://doi.org/10.1117/12.854949

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