Development of an intracavity EUV Source based on a high-power Ti:sapphire oscillator

Enikoe Seres; Christian Spielmann

doi:10.1117/12.854598

17 May 2010 Development of an intracavity EUV Source based on a high-power Ti:sapphire oscillator

Enikoe Seres, Christian Spielmann

Proceedings Volume 7721, Solid State Lasers and Amplifiers IV, and High-Power Lasers; 77210I (2010) https://doi.org/10.1117/12.854598
Event: SPIE Photonics Europe, 2010, Brussels, Belgium

Abstract

We report on the realization towards a compact, pulsed XUV source for high temporal and spatial resolution pumpprobe spectroscopy. The system will be based on intracavity high harmonic generation in a Ti:sapphire oscillator. An oscillator with repetition rate of 20 MHz has been realized, which operates in the net negative (near zero) dispersion regime with intracavity pulse energy up to 280 nJ. The cavity has been extended with a secondary focus, where the high harmonic generation can take place. In the recent state, the oscillator is capable to generate XUV harmonics up to 35 eV.

Citation Download Citation

Enikoe Seres and Christian Spielmann "Development of an intracavity EUV Source based on a high-power Ti:sapphire oscillator", Proc. SPIE 7721, Solid State Lasers and Amplifiers IV, and High-Power Lasers, 77210I (17 May 2010); https://doi.org/10.1117/12.854598

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