Paper
29 July 2010 The technical challenges of the Solar-Orbiter EUI instrument
Jean-Philippe Halain, Pierre Rochus, Thierry Appourchaux, David Berghmans, Louise Harra, Udo Schühle, Frédéric Auchère, Andrei Zhukov, Etienne Renotte, Jean-Marc Defise, Laurence Rossi, Karl Fleury-Frenette, Lionel Jacques, Jean-François Hochedez, Ali Ben Moussa
Author Affiliations +
Abstract
The Extreme Ultraviolet Imager (EUI) onboard Solar Orbiter consists of a suite of two high-resolution imagers (HRI) and one dual-band full Sun imager (FSI) that will provide EUV and Lyman-α images of the solar atmospheric layers above the photosphere. The EUI instrument is based on a set of challenging new technologies allowing to reach the scientific objectives and to cope with the hard space environment of the Solar Orbiter mission. The mechanical concept of the EUI instrument is based on a common structure supporting the HRI and FSI channels, and a separated electronic box. A heat rejection baffle system is used to reduce the Sun heat load and provide a first protection level against the solar disk straylight. The spectral bands are selected by thin filters and multilayer mirror coatings. The detectors are 10μm pitch back illuminated CMOS Active Pixel Sensors (APS), best suited for the EUI science requirements and radiation hardness. This paper presents the EUI instrument concept and its major sub-systems. The current developments of the instrument technologies are also summarized.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jean-Philippe Halain, Pierre Rochus, Thierry Appourchaux, David Berghmans, Louise Harra, Udo Schühle, Frédéric Auchère, Andrei Zhukov, Etienne Renotte, Jean-Marc Defise, Laurence Rossi, Karl Fleury-Frenette, Lionel Jacques, Jean-François Hochedez, and Ali Ben Moussa "The technical challenges of the Solar-Orbiter EUI instrument", Proc. SPIE 7732, Space Telescopes and Instrumentation 2010: Ultraviolet to Gamma Ray, 77320R (29 July 2010); https://doi.org/10.1117/12.857976
Lens.org Logo
CITATIONS
Cited by 13 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Sensors

Extreme ultraviolet

Optical filters

Mirrors

Multilayers

Prototyping

Imaging systems

Back to Top