Pupil masks for 2-D intensity synthesis in a high numerical aperture focusing system

Leelada Rattanavija; Sherif S. Sherif; Waleed S. Mohammed

doi:10.1117/12.863847

19 May 2010 Pupil masks for 2-D intensity synthesis in a high numerical aperture focusing system

Leelada Rattanavija, Sherif S. Sherif, Waleed S. Mohammed

Proceedings Volume 7743, Southeast Asian International Advances in Micro/Nanotechnology; 77430N (2010) https://doi.org/10.1117/12.863847
Event: Southeast Asian International Advances in Micro/Nano-technology, 2010, Bangkok, Thailand

Abstract

A high numerical aperture (NA) lens is used in many applications that require tightly focused beams including microscopy. The Debye-Wolf electromagnetic diffraction integral describes focusing by high NA lenses. Using an eigenfunction expansion of this integral, we numerically obtain a pupil mask that generates an arbitrary, within the diffraction limit, intensity distribution at the Gaussian focal plane.

Citation Download Citation

Leelada Rattanavija, Sherif S. Sherif, and Waleed S. Mohammed "Pupil masks for 2-D intensity synthesis in a high numerical aperture focusing system", Proc. SPIE 7743, Southeast Asian International Advances in Micro/Nanotechnology, 77430N (19 May 2010); https://doi.org/10.1117/12.863847

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