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14 December 2010 Structures patterning by non-contact NSOM lithography
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Proceedings Volume 7746, 17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics; 774616 (2010) https://doi.org/10.1117/12.881759
Event: 17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 2010, Liptovsky Jan, Slovakia
Abstract
This contribution presents experimental results from the fabrication of planar photonic structures with two-dimensional (2D) arrangement. We demonstrate the near-field scanning optical microscope (NSOM) lithography as an effective optical method for fabrication of 2D photonic structures in thin photoresist layer. We employ a non-contact mode of NSOM lithography using a metal coated fiber tip in combination with 3D nanoposition piezosystem. Prepared photonic structures in thin photoresist layer deposited on the GaAs substrate are analyzed by scanning probe diagnostics. Set of experiments was realized in order to improve the aspect ratio of the patterned structures, where the exposure time and the intensity of the exposing field were parameters.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ivana Kubicová, Dušan Pudiš, Lubos Šušlik, Jaroslava Škriniarová, Sofia Slabeyciusová, and Ivan Martinček "Structures patterning by non-contact NSOM lithography", Proc. SPIE 7746, 17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 774616 (14 December 2010); https://doi.org/10.1117/12.881759
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