PROCEEDINGS VOLUME 7748
PHOTOMASK AND NGL MASK TECHNOLOGY XVII | 13-15 APRIL 2010
Photomask and Next-Generation Lithography Mask Technology XVII
Editor(s): Kunihiro Hosono
Editor Affiliations +
PHOTOMASK AND NGL MASK TECHNOLOGY XVII
13-15 April 2010
Yokohama, Japan
Front Matter: Volume 7748
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774801 (2010) https://doi.org/10.1117/12.869338
Invited Papers Session
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774802 (2010) https://doi.org/10.1117/12.864085
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774803 (2010) https://doi.org/10.1117/12.867979
EUV Mask I
Han-Shin Lee, Jaehyuck Choi, DonGun Lee, Hyungho Ko, SeongSu Kim, Chan-Uk Jeon, HanKu Cho
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774804 (2010) https://doi.org/10.1117/12.868292
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774805 (2010) https://doi.org/10.1117/12.867774
EUV Mask II
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774806 (2010) https://doi.org/10.1117/12.866470
Kazunori Seki, Masafumi Shibita, Takashi Yoshii, Tsukasa Fujimoto, Yo Sakata, Shinji Akima
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774807 (2010) https://doi.org/10.1117/12.867754
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774808 (2010) https://doi.org/10.1117/12.865490
Nano Imprint and Patterned Media
Yoshiyuki Kamata, Akira Kikitsu, Naoko Kihara, Seiji Morita, Kaori Kimura, Haruhiko Izumi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774809 (2010) https://doi.org/10.1117/12.863873
Kang Luo, Steven Ha, John Fretwell, Rick Ramos, Zhengmao Ye, Gerard Schmid, Dwayne LaBrake, Douglas J. Resnick, S. V. Sreenivasan
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480A (2010) https://doi.org/10.1117/12.866882
Material and Process
Takashi Mizoguchi, Monica Barrett, Satoshi Akutagawa, Michael Caterer, Robert Nolan, Dennis Plouffe, Nancy Zhou
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480C (2010) https://doi.org/10.1117/12.865005
Tomohiro Imoto, Yosuke Kojima, Norihito Fukugami, Takashi Haraguchi, Tsuyoshi Tanaka
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480D (2010) https://doi.org/10.1117/12.866417
Process and Repair
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480E (2010) https://doi.org/10.1117/12.865881
Pavel Nesladek, Valentine Baudiquez, Eugen Foca, Björn Sass
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480F (2010) https://doi.org/10.1117/12.864119
Tod Robinson, Roy White, Ron Bozak, Jeff LeClaire, Mike Archuletta, David Lee
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480G (2010) https://doi.org/10.1117/12.865197
Pattern Generation
Elmar Platzgummer, Stefan Cernusca, Christof Klein, Samuel Kvasnica, Bernd Sonalkar, Hans Loeschner
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480H (2010) https://doi.org/10.1117/12.866350
Tadashi Komagata, Takahisa Hasegawa, Kazuya Goto, Kenji Kono, Ryuuji Yamamoto, Naoki Nishida, Yasutoshi Nakagawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480I (2010) https://doi.org/10.1117/12.866750
Sang Hee Lee, Jin Choi, Seong Jun Min, Hee Bom Kim, Byung Gook Kim, Sang-Gyun Woo, Han-Ku Cho
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480J (2010) https://doi.org/10.1117/12.868264
Metrology and Inspection
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480K (2010) https://doi.org/10.1117/12.866849
Klaus-Dieter Roeth, Frank Laske, Karl-Heinrich Schmidt, Dieter Adam, Oliver Ache, David Ilsen
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480L (2010) https://doi.org/10.1117/12.867720
Dirk Beyer, Patricia Gabella, Greg Hughes, Gerd Klose, Norbert Rosenkranz
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480M (2010) https://doi.org/10.1117/12.867913
Kangjoon Seo, MunSik Kim, Sang Chul Kim, JaeCheon Shin, ChangYeol Kim, John Miller, Aditya Dayal, Trent Hutchinson, KiHun Park
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480N (2010) https://doi.org/10.1117/12.864109
T. Touya, S. Tamamushi, N. Takamatsu
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480O (2010) https://doi.org/10.1117/12.867221
Amir Sagiv, Aviram Tam, Wolf Staud, Linyong Pang, Danping Peng, Lin He, Dongxue Chen, Thuc Dam, Vikram Tolani
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480P (2010) https://doi.org/10.1117/12.868053
Hidemichi Imai, Takeshi Kosuge, Kei Mesuda, Eiji Tsujimoto, Hideyoshi Takamizawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480Q (2010) https://doi.org/10.1117/12.867983
Mask-related Lithography
EDA, DFM, and MDP
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480X (2010) https://doi.org/10.1117/12.866971
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480Y (2010) https://doi.org/10.1117/12.864285
Poster Session: Material and Process
Yuji Nagashima, Koichi Higuchi, Tsutomu Kikuchi, Yoshiaki Kurokawa, Harumichi Hirose, Mikio Nonaka
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77480Z (2010) https://doi.org/10.1117/12.867980
Nancy Zhou, Monica Barrett, Robert Nolan, Dennis Plouffe, Jason Ritter, Alfred Wagner, Michael Caterer, Takashi Mizoguchi, Satoshi Akutagawa, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774810 (2010) https://doi.org/10.1117/12.865042
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774811 (2010) https://doi.org/10.1117/12.864478
Won-Hee Chae, Guen-Ho Hwang, Soon-Kyu Seo, Dae-Han Kim, Dong-Heok Lee, Moon-Hwan Choi, Sang-Soo Choi, Dong-Gun Kim, Doo-Hoon Geum, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774812 (2010) https://doi.org/10.1117/12.867968
Sergey Babin, Konstantin Bay
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774813 (2010) https://doi.org/10.1117/12.868147
Poster Session: Pattern Generation
Yasuko Saito, George Chen, Jen-Shiang Wang, Shufeng Bai, Rafael Howell, Jiangwei Li, Jun Tao, Doug VanDenBroeke, Jim Wiley, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774814 (2010) https://doi.org/10.1117/12.867969
Michael Jurisch, Mathias Irmscher, Florian Letzkus, Stefan Eder-Kapl, Christof Klein, Hans Loeschner, Walter Piller, Elmar Platzgummer
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774815 (2010) https://doi.org/10.1117/12.865478
Akio Yamada, Yoshihisa Oae, Tatsuro Okawa, Masahiro Takizawa, Masaki Yamabe
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774816 (2010) https://doi.org/10.1117/12.864286
H. Hoshi, N. Samoto, H. Manabe, O. Wakimoto, S. Iida, M. Yamabe
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774817 (2010) https://doi.org/10.1117/12.864043
Martin Schulz, Hans-Jürgen Stock, Ulrich Klostermann, Wolfgang Hoppe, Lars Bomholt, Philipp Jaschinsky, Kang-Hoon Choi, Manuela Gutsch, Holger Sailer, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774818 (2010) https://doi.org/10.1117/12.866695
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774819 (2010) https://doi.org/10.1117/12.868174
Poster Session: Metrology and Inspection
Tsutomu Murakawa, Yoshiaki Ogiso, Toshimichi Iwai, Jun Matsumoto, Takayuki Nakamura
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481A (2010) https://doi.org/10.1117/12.866056
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481B (2010) https://doi.org/10.1117/12.867929
Richard Tu, Thomas Sebald
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481C (2010) https://doi.org/10.1117/12.866487
Satoshi Yamamoto, Ravi Pai, Manish Ranade, Soumen Mondal, Sundeep Prabhu, Gen Kurosaki
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481D (2010) https://doi.org/10.1117/12.864177
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481E (2010) https://doi.org/10.1117/12.867721
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481F (2010) https://doi.org/10.1117/12.863806
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481G (2010) https://doi.org/10.1117/12.864415
Poster Session: Repair
Tod Robinson, Daniel Yi, Roy White, Ron Bozak, Mike Archuletta, David Lee
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481H (2010) https://doi.org/10.1117/12.865198
Tsuyoshi Amano, Noriaki Takagi, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, et al.
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481I (2010) https://doi.org/10.1117/12.867233
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481J (2010) https://doi.org/10.1117/12.864098
Poster Session: EDA, DFM, and MDP
Yoonna Oh, Jae-Pil Shin, Jin Choi, Jong-Bae Lee, Moon-Hyun Yoo
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481L (2010) https://doi.org/10.1117/12.866273
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481M (2010) https://doi.org/10.1117/12.864104
Kokoro Kato, Masakazu Endo, Tadao Inoue, Masaki Yamabe, Shigetoshi Nakatake
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481N (2010) https://doi.org/10.1117/12.864084
Domingo Morales, Juan Pablo Canepa, Daniel Cohen
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481O (2010) https://doi.org/10.1117/12.866029
Aki Fujimura, Christophe Pierrat, Taiichi Kiuchi, Tadashi Komagata, Yasutoshi Nakagawa
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481P (2010) https://doi.org/10.1117/12.866412
Johnny Yeap, Raghava Kondepudy, Parikshit Kulkarni, Yuichi Kawase, Russell Cinque
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481R (2010) https://doi.org/10.1117/12.864159
Poster Session: Mask-related Lithography
Poster Session: NGL Masks and Applications
Jin-Back Park, Kyoung-Yoon Bang, Dong-Gun Lee, Hae-Young Jeong, Seung-Soo Kim, Han-Ku Cho
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481X (2010) https://doi.org/10.1117/12.868293
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481Y (2010) https://doi.org/10.1117/12.864093
Hiromasa Iyama, Kazuhiro Hamamoto, Shuji Kishimoto, Masasuke Nakano, Takeshi Kagatsume, Takashi Sato, Hideo Kobayashi, Tsuyoshi Watanabe
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 77481Z (2010) https://doi.org/10.1117/12.869098
Masami Yonekawa, Kazuya Ota, Takao Taguchi, Osamu Suga
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774820 (2010) https://doi.org/10.1117/12.867044
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774821 (2010) https://doi.org/10.1117/12.867910
Shmoolik Mangan, Aya Kantor, Nir Shoshani, Asaf Jaffe, Dror Kasimov, Vladislav Kudriashov, Ran Brikman, Lior Shoval, Anoop Sreenath
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774822 (2010) https://doi.org/10.1117/12.868140
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774823 (2010) https://doi.org/10.1117/12.862641
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774824 (2010) https://doi.org/10.1117/12.868924
Eiji Yamanaka, Masamitsu Itoh, Masaya Kato, Kusuo Ueno, Kyouhei Hayashi, Akira Higuchi, Naoya Hayashi
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774825 (2010) https://doi.org/10.1117/12.868631
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774826 (2010) https://doi.org/10.1117/12.867911
Poster Session: Metrology and Inspection (continued)
Sunghyun Oh, DaeHo Hwang, Inpyo Kim, Changreol Kim, Aviram Tam, Michael Ben Yishai, Yulian Wolff
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774827 (2010) https://doi.org/10.1117/12.869574
William H. Broadbent, David S Alles, Michael T. Giusti, Damon F. Kvamme, Rui-fang Shi, Weston L. Sousa, Robert Walsh, Yalin Xiong
Proceedings Volume Photomask and Next-Generation Lithography Mask Technology XVII, 774828 (2010) https://doi.org/10.1117/12.868417
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