Assessing equipment and process related electrostatic risks to reticles with E-Reticle system

Richard Tu; Thomas Sebald

doi:10.1117/12.866487

26 May 2010 Assessing equipment and process related electrostatic risks to reticles with E-Reticle^TM system

Richard Tu, Thomas Sebald

Proceedings Volume 7748, Photomask and Next-Generation Lithography Mask Technology XVII; 77481C (2010) https://doi.org/10.1117/12.866487
Event: Photomask and NGL Mask Technology XVII, 2010, Yokohama, Japan

Abstract

The E-Reticle^TM system was used to assess the electrostatic risks from mask manufacturing equipment and processes. Test results showed that some mechanical operations of the equipment examined may cause electrostatic potential differences in a production reticle higher than the ITRS recommended specifications, which may bring electrostatic risks to the reticle. E-Reticle^TM data also indicated that the processes play an important role in controlling electrostatic potentials in the reticle. The E-Reticle^TM system can be used as an in-situ equipment assessment tool, as well as a process optimization device.

Citation Download Citation

Richard Tu and Thomas Sebald "Assessing equipment and process related electrostatic risks to reticles with E-Reticle^TM system", Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481C (26 May 2010); https://doi.org/10.1117/12.866487

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