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25 May 2010 Mask inspection system with variable sensitivity and printability verification function
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Proceedings Volume 7748, Photomask and Next-Generation Lithography Mask Technology XVII; 77481G (2010) https://doi.org/10.1117/12.864415
Event: Photomask and NGL Mask Technology XVII, 2010, Yokohama, Japan
Abstract
We report on the development of a new mask inspection technology that makes total inspection faster and less costly. The new technology adopts a method of selecting a defect detection sensitivity level for every local area, defined by factors such as defect judgment algorithm and defect judgment threshold. This approach results in a reduction of pseudodefect count leading to shorter inspection and review time. Selected defect detection sensitivity levels for every local area are extracted from a database of Mask Data Rank (MDR) that is based on the design intent from the design stage, and/or on a pre-analysis of inspection pattern data. The proposed system also executes a printability verification function, not only for the mask defect regions but also for specific portions where high Mask Error Enhancement Factor (MEEF) is determined. It is necessary to ascertain suppression of pseudo-defect detection for extremely complicated masks such as masks with Source-Mask Optimization (SMO). This work reports on the new mask inspection system.
© (2010) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takafumi Inoue, Kenichi Takahara, Hideo Tsuchiya, Masakazu Tokita, Tadao Inoue, and Masaki Yamabe "Mask inspection system with variable sensitivity and printability verification function", Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77481G (25 May 2010); https://doi.org/10.1117/12.864415
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