New method of fabrication Fresnel zone plate for hard x-ray radiation

A. V. Kuyumchyan; D. A. Kuyumchyan; V. V. Aristov; E. V. Shulakov

doi:10.1117/12.860100

27 August 2010 New method of fabrication Fresnel zone plate for hard x-ray radiation

A. V. Kuyumchyan, D. A. Kuyumchyan, V. V. Aristov, E. V. Shulakov

Proceedings Volume 7764, Nanoengineering: Fabrication, Properties, Optics, and Devices VII; 77640R (2010) https://doi.org/10.1117/12.860100
Event: SPIE NanoScience + Engineering, 2010, San Diego, California, United States

Abstract

We present the first results of fabrication the circular zone plate by means of high resolution negative tone inorganic HSQ (Hydrogen Silsesquioxane or XR-1541) electron-beam resist. Fresnel zone plates (FZPs) has been fabricated on the surface of silicon crystals for the energy from 8keV up to 100keV by electron beam lithography. Three different FZPs have been fabricated; circular FZP for the first diffraction order, circular compound FZP for the first and third diffraction order, and linear FZP for the first and second diffraction order. The parameters of the compound FZPs for first and third order were the following: the focal distance of first and third orders FZP is F =13.229cm for 0.1nm wavelength, the entire aperture is 400.0016μm, the width of the outermost zones of the first and third orders is 100nm, and the number of the first and third order zones is 1223.

Citation Download Citation

A. V. Kuyumchyan, D. A. Kuyumchyan, V. V. Aristov, and E. V. Shulakov "New method of fabrication Fresnel zone plate for hard x-ray radiation", Proc. SPIE 7764, Nanoengineering: Fabrication, Properties, Optics, and Devices VII, 77640R (27 August 2010); https://doi.org/10.1117/12.860100

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