Device fabrication processes of DNA-CTMA based photonic devices: improving the processability by using DNA-CTMA-OMMA hybrids

Junichi Yoshida; Yutaka Kawabe; Naoya Ogata

doi:10.1117/12.862402

24 August 2010 Device fabrication processes of DNA-CTMA based photonic devices: improving the processability by using DNA-CTMA-OMMA hybrids

Junichi Yoshida, Yutaka Kawabe, Naoya Ogata

Author Affiliations +

Proceedings Volume 7765, Nanobiosystems: Processing, Characterization, and Applications III; 776506 (2010) https://doi.org/10.1117/12.862402
Event: SPIE NanoScience + Engineering, 2010, San Diego, California, United States

Abstract

DNA-CTMA or DNA-CTMA-PMMA films have been studied as a potential material for waveguide type thin-film photonic devices such as dye-doped thin film lasers, optical waveguide amplifiers, or optical waveguide switches. For the purpose of evaluate processability, not only optical characteristics of the fluorescence intensity but also moisture resistance of the film have been investigated. It is found that optical characteristics of those films are equally matched to the conventional DNA-CTMA films with better moisture resistivity. Waveguide fabrication experiments by using DNA-CTMA-PMMA films showed good moisture resistant nature and processability.

Citation Download Citation

Junichi Yoshida, Yutaka Kawabe, and Naoya Ogata "Device fabrication processes of DNA-CTMA based photonic devices: improving the processability by using DNA-CTMA-OMMA hybrids", Proc. SPIE 7765, Nanobiosystems: Processing, Characterization, and Applications III, 776506 (24 August 2010); https://doi.org/10.1117/12.862402

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