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19 August 2010 Spectroscopic ellipsometry of a-Si/SiO2 large waveband coating for the JWST-FGS-TFI etalon plates fabrication
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Abstract
Previous publications for the JWST-FGS-TFI instrument described the design and fabrication of mirror coatings for scanning Fabry-Perot etalons. Since that time, we have extended the fabrication process using ellipsometry analysis over the full operational bandwidth from 1.0 to 5.0 microns for both mirror and anti-reflection coatings. This paper will present single and multiple layer ellipsometry analysis of the a-Si/SiO2 optical properties. Analysis improvement came from a-Si/SiO2 interface consideration and simultaneous use of ellipsometric data from Woollam V-VASE and IRVASE instruments. Simulations of reflectance and transmittance based on the ellipsometric analysis results will also be compared to spectrophotometric measurements for witness pieces.
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Michel Poirier, Clinton Evans, Craig Haley, Driss Touahri, and Rene Doyon "Spectroscopic ellipsometry of a-Si/SiO2 large waveband coating for the JWST-FGS-TFI etalon plates fabrication", Proc. SPIE 7786, Current Developments in Lens Design and Optical Engineering XI; and Advances in Thin Film Coatings VI, 77860M (19 August 2010); https://doi.org/10.1117/12.863034
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