Recent upgrades to the Diamond-NOM: A slope measuring profiler capable of characterizing the surface profile of large optics with sub-nanometer repeatability

Simon G. Alcock; Kawal J. S. Sawhney; Stewart Scott

doi:10.1117/12.861623

27 August 2010 Recent upgrades to the Diamond-NOM: A slope measuring profiler capable of characterizing the surface profile of large optics with sub-nanometer repeatability

Simon G. Alcock, Kawal J. S. Sawhney, Stewart Scott

Author Affiliations +

Proceedings Volume 7801, Advances in Metrology for X-Ray and EUV Optics III; 780105 (2010) https://doi.org/10.1117/12.861623
Event: SPIE Optical Engineering + Applications, 2010, San Diego, California, United States

Abstract

The Diamond-NOM is a non-contact, slope measuring profiler, capable of measuring surface topography of large optics (up to 1.5m long) with sub-nanometre height resolution and repeatability. On numerous occasions, the Diamond-NOM has proven to be an invaluable metrology tool for independently validating new beamline optics, and for investigating potential problems with optics from established beamlines. Data from the Diamond-NOM have consistently been in close agreement with results generated by a range of metrology instruments at other synchrotron laboratories and optic manufacturers. Prior to beamline installation, significant X-ray commissioning time was saved by optimizing and calibrating adaptive optics using the Diamond-NOM. We report on the current operational capabilities of the Diamond- NOM and give technical details of recent upgrades, including a penta-mirror (two, high grade reflectors used to mimic the internal working surfaces of a traditional pentaprism) and the capability to measure optics in sideward, downward, or upward facing geometries.

Citation Download Citation

Simon G. Alcock, Kawal J. S. Sawhney, and Stewart Scott "Recent upgrades to the Diamond-NOM: A slope measuring profiler capable of characterizing the surface profile of large optics with sub-nanometer repeatability", Proc. SPIE 7801, Advances in Metrology for X-Ray and EUV Optics III, 780105 (27 August 2010); https://doi.org/10.1117/12.861623

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