Generalization of shot definition for variable shaped e-beam machines for write time reduction

Emile Sahouria; Amanda Bowhill

doi:10.1117/12.867994

24 September 2010 Generalization of shot definition for variable shaped e-beam machines for write time reduction

Emile Sahouria, Amanda Bowhill

Proceedings Volume 7823, Photomask Technology 2010; 78230T (2010) https://doi.org/10.1117/12.867994
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

We propose a new aperture stage for shaped e-beam exposure tools. This aperture stage is able to print an "L" shape in a single exposure shot. The aperture may be used in mask- and wafer-patterning e-beam tools. The physical and mechanical nature of the aperture appears to be fundamentally similar to existing apertures that form rectangular shapes, yet it reduces the required shot count for exposure by as much as half.

Citation Download Citation

Emile Sahouria and Amanda Bowhill "Generalization of shot definition for variable shaped e-beam machines for write time reduction", Proc. SPIE 7823, Photomask Technology 2010, 78230T (24 September 2010); https://doi.org/10.1117/12.867994

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