Improvement of actinic blank inspection and phase defect analysis

Takeshi Yamane; Toshihiko Tanaka; Tsuneo Terasawa; Osamu Suga

doi:10.1117/12.864290

29 September 2010 Improvement of actinic blank inspection and phase defect analysis

Takeshi Yamane, Toshihiko Tanaka, Tsuneo Terasawa, Osamu Suga

Proceedings Volume 7823, Photomask Technology 2010; 78231V (2010) https://doi.org/10.1117/12.864290
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

We have developed an actinic full-field inspection system to detect multilayer phase defect with dark field imaging. A new CCD camera was installed onto the system with an objective of throughput and inspection sensitivity improvement. As the result, the throughput was improved from 14.25 to 4.75 hours per plate, and the detection probability for 1.2 nmhigh 40 nm-wide defect was found to be 95.7 %. This means that the system has a potential of its extendibility to beyond 22 nm HP inspection.

Citation Download Citation

Takeshi Yamane, Toshihiko Tanaka, Tsuneo Terasawa, and Osamu Suga "Improvement of actinic blank inspection and phase defect analysis", Proc. SPIE 7823, Photomask Technology 2010, 78231V (29 September 2010); https://doi.org/10.1117/12.864290

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