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29 September 2010 Advanced mask CD MTT correction technique through improvement of CD measurement repeatability of CD SEM
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In this study, the method to achieve the precise CD MTT (critical dimension mean to target) correction in manufacturing attenuated PSM (phase-shift mask) is investigated. There has been a growing demand for more precise Mask CD MTT control in recent years. The CD correction method has been developed and applied to meet the tighter CD MTT specification [1]. However, the efficiency of the CD correction is greatly affected by the repeatability of the CD measurement. The factors, which can have an influence on the CD measurement, are the fluctuations of the pattern profile and the electron current of the SEM. The conventional CD MTT correction method is basically to correct MoSi CD MTT by applying the additional dry etch for MoSi based on Cr CD value. Therefore, the repeatability of the Cr CD MTT is the crucial point for the accuracy of the final CD MTT correction. Although the Cr CD MTT is the crucial factor for the successful CD MTT correction, it has the fluctuation due to the Cr pattern profile. If the Cr pattern profile has low patterned angle after MoSi etch process, it can cause the focusing error in the CD measurement using CD SEM. Therefore, a method to improve the reliability of the Cr CD MTT should be developed. The IS and the normalized Delta CD concepts are adopted to obtain more reliable Cr CD MTT. The IS refer the variation of the Cr CD MTT according to the difference in CD values with CD measuring thresholds. The normalized Delta CD is obtained from the correlation of IS and Delta CD. Finally, the normalized Delta CD is applied to correct the MoSi CD MTT by dry etch process. The reduction of the Cr CD MTT fluctuation range is achieved by using the new CD correlation process including IS and the normalized Delta CD. Consequently, the final MoSi CD MTT is improved 60% of range by using the new CD correlation process.
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Choong Han Ryu, Ho Yong Jung, Jea Young Jun, Tae Joong Ha, Chang Reol Kim, and Oscar Han "Advanced mask CD MTT correction technique through improvement of CD measurement repeatability of CD SEM", Proc. SPIE 7823, Photomask Technology 2010, 78232J (29 September 2010);


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