A new CDSEM metrology method for thin film hardmasks patterns using multiple detectors

Sumito Harada; Yuta Chihara; Motoji Hirano; Toshi Iwai; Masayuki Kuribara; Ikuo Iko; Masahiro Seyama; Jun Matsumoto; Takayuki Nakamura

doi:10.1117/12.864171

24 September 2010 A new CDSEM metrology method for thin film hardmasks patterns using multiple detectors

Sumito Harada, Yuta Chihara, Motoji Hirano, Toshi Iwai, Masayuki Kuribara, Ikuo Iko, Masahiro Seyama, Jun Matsumoto, Takayuki Nakamura

Author Affiliations +

Proceedings Volume 7823, Photomask Technology 2010; 78233H (2010) https://doi.org/10.1117/12.864171
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

Thin film hardmasks with 10nm or less are used in double patterning techniques to generate fine patterns for 32nm-node and beyond. Using a conventional Mask CDSEM for ultra accurate measurement of patterns on these thin film hardmasks is difficult due to weakness of the edge profiles generated by a scanning electron beam. Additionally, the tones of a SEM image can be reversed due to a charging phenomenon, which causes false recognition of lines and spaces. This paper addresses ultra accurate measurement of thin film hardmasks using a new measurement algorithm that is applied to profiles obtained from multiple detectors.

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Sumito Harada, Yuta Chihara, Motoji Hirano, Toshi Iwai, Masayuki Kuribara, Ikuo Iko, Masahiro Seyama, Jun Matsumoto, and Takayuki Nakamura "A new CDSEM metrology method for thin film hardmasks patterns using multiple detectors", Proc. SPIE 7823, Photomask Technology 2010, 78233H (24 September 2010); https://doi.org/10.1117/12.864171

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