Optimized reticle alignment structures for minimizing aberration sensitivities and pattern shifts

Barry Moest; Mark van de Kerkhof; Haico Kok

doi:10.1117/12.864476

24 September 2010 Optimized reticle alignment structures for minimizing aberration sensitivities and pattern shifts

Barry Moest, Mark van de Kerkhof, Haico Kok

Proceedings Volume 7823, Photomask Technology 2010; 78233J (2010) https://doi.org/10.1117/12.864476
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

With the continued shrinks in production structures to 38 nm and below for hyper-NA lithographic tools, there is an opportunity to further optimize these reticle alignment structures to reduce overlay numbers and improve yield. This opportunity is especially relevant for Dual Patterning applications where pattern shifts under different imaging conditions become critical. In this paper, we will present a proposal for improved reticle alignment structures to minimize the sensitivities for lens aberrations and thereby to minimize the contribution of reticle alignment to pattern shifts. Some alternatives will also be addressed. Full compatibility of the proposed alignment structures with older machines as well as continued compatibility of older reticles on the new lithographic tools will be discussed.

Citation Download Citation

Barry Moest, Mark van de Kerkhof, and Haico Kok "Optimized reticle alignment structures for minimizing aberration sensitivities and pattern shifts", Proc. SPIE 7823, Photomask Technology 2010, 78233J (24 September 2010); https://doi.org/10.1117/12.864476

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