Duplicated templates for discrete track media

Atsushi Tatsugawa; Noriko Yamashita; Tadashi Oomatsu; Kenji Saitou; Takashi Katou; Toshihide Ishioka; Kazuyuki Usuki

doi:10.1117/12.864192

24 September 2010 Duplicated templates for discrete track media

Atsushi Tatsugawa, Noriko Yamashita, Tadashi Oomatsu, Kenji Saitou, Takashi Katou, Toshihide Ishioka, Kazuyuki Usuki

Author Affiliations +

Proceedings Volume 7823, Photomask Technology 2010; 78233L (2010) https://doi.org/10.1117/12.864192
Event: SPIE Photomask Technology, 2010, Monterey, California, United States

Abstract

Duplicated templates from a patterned silicon master were studied. The pattern was fabricated on a silicon wafer by rotary electron beam (EB) writer and reactive ion etching (RIE). 2.5-inch full surface discrete track media (DTM) templates of TP70nm supporting skewed servo patterns and discrete tracks were fabricated. The pattern on the silicon master was successfully transferred to quartz templates by UV nanoimprint lithography (NIL) and RIE using a specially prepared UV-NIL resist. TP60nm pattern fabrication was also accomplished by this same hard mask-less method. Servo pattern printing (SPP) was used to investigate the repeatable run-out (RRO) of servo patterns. Nickel molds and quartz templates were duplicated from the same silicon master by their respective processes and their RROs compared. It was found that the duplication process (quartz or nickel) influenced the RRO profile and that the quartz NIL process did not significantly degrade RRO.

Citation Download Citation

Atsushi Tatsugawa, Noriko Yamashita, Tadashi Oomatsu, Kenji Saitou, Takashi Katou, Toshihide Ishioka, and Kazuyuki Usuki "Duplicated templates for discrete track media", Proc. SPIE 7823, Photomask Technology 2010, 78233L (24 September 2010); https://doi.org/10.1117/12.864192

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