Submicrometer-resolution mapping of ultraweak 355-nm absorption in HfO2 monolayers using photothermal heterodyne imaging

S. Papernov; A. Tait; W. Bittle; A. W. Schmid; J. B. Oliver; P. Kupinski

doi:10.1117/12.868236

30 November 2010 Submicrometer-resolution mapping of ultraweak 355-nm absorption in HfO₂ monolayers using photothermal heterodyne imaging

S. Papernov, A. Tait, W. Bittle, A. W. Schmid, J. B. Oliver, P. Kupinski

Author Affiliations +

Proceedings Volume 7842, Laser-Induced Damage in Optical Materials: 2010; 78420A (2010) https://doi.org/10.1117/12.868236
Event: Laser Damage Symposium XLII: Annual Symposium on Optical Materials for High Power Lasers, 2010, Boulder, Colorado, United States

Abstract

Nanosecond-pulse UV-laser-damage initiation in multilayer coatings comprised from metal oxide as a high-index component, and silica oxide as a low-index material, is strongly linked to metal oxide. The nature of the absorbing species and their physical properties remain unknown because of extremely small sizes. Previous experimental evidence provided by high-resolution mapping of damage morphology points to a few-nanometer scale of these absorbers. This work demonstrates submicrometer mapping of 355-nm absorption in HfO₂ monolayers using a recently developed photothermal heterodyne imaging technique. Comparison of absorption maps with spatial distribution of UV pulsed-laser- induced damage morphology allows one to better estimate the size and densities of nanoscale absorbing defects in hafnia thin films. Possible defect-formation mechanisms are discussed.

Citation Download Citation

S. Papernov, A. Tait, W. Bittle, A. W. Schmid, J. B. Oliver, and P. Kupinski "Submicrometer-resolution mapping of ultraweak 355-nm absorption in HfO₂ monolayers using photothermal heterodyne imaging", Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 78420A (30 November 2010); https://doi.org/10.1117/12.868236

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