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3 December 2010Improvement of laser damage resistance and diffraction efficiency of multilayer dielectric diffraction gratings by HF etchback linewidth tailoring
Multilayer dielectric (MLD) diffraction gratings for Petawatt-class laser systems possess unique laser damage
characteristics. Details of the shape of the grating lines and the concentration of absorbing impurities on the
surface of the grating structures both have strong effects on laser damage threshold. It is known that electric field
enhancement in the solid material comprising the grating lines varies directly with the linewidth and inversely with
the line height for equivalent diffraction efficiency. Here, we present an overview of laser damage
characteristics of MLD gratings, and describe a process for post-processing ion-beam etched grating lines using
very dilute buffered hydrofluoric acid solutions. This process acts simultaneously to reduce grating linewidth and
remove surface contaminants, thereby improving laser damage thresholds through two pathways.
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Hoang T. Nguyen, Cindy C. Larson, Jerald A. Britten, "Improvement of laser damage resistance and diffraction efficiency of multilayer dielectric diffraction gratings by HF etchback linewidth tailoring," Proc. SPIE 7842, Laser-Induced Damage in Optical Materials: 2010, 78421H (3 December 2010); https://doi.org/10.1117/12.867921