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24 January 2011 Characterization of pixel crosstalk and impact of Bayer patterning by quantum efficiency measurement
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Proceedings Volume 7876, Digital Photography VII; 787613 (2011)
Event: IS&T/SPIE Electronic Imaging, 2011, San Francisco Airport, California, United States
Development of small pixels for high resolution image sensors implies a lot of challenges. A high level of performance should be guaranteed whereas the overall size must be reduced and so the degree of freedom in design and process. One key parameter of this constant improvement is the knowledge and the control of the crosstalk between pixels. In this paper, we present an advance in crosstalk characterization method based on the design of specific color patterns and the measurement of quantum efficiency. In a first part, we describe the color patterns designed to isolate one pixel or to simulate un-patterned colored pixels. These patterns have been implemented on test-chip and characterized. The second part deals with the characterization setup for quantum efficiency. Indeed, the use of spectral measurements allows us to discriminate pixels based on the color filter placed on top of them and to probe the crosstalk as a function of the depth in silicon, thanks to the photon absorption length variation with the wavelength. In the last part, results are presented showing the impact of color filters patterning, i.e. pixels in a Bayer pattern versus un-patterned pixels. The crosstalk directions and amplitudes are also analyzed in relation to pixel layout.
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Jérôme Vaillant, Clémence Mornet, Thomas Decroux, Didier Hérault, and Isabelle Schanen "Characterization of pixel crosstalk and impact of Bayer patterning by quantum efficiency measurement", Proc. SPIE 7876, Digital Photography VII, 787613 (24 January 2011);

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