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8 February 2011 Selective inhibition of polymerization enables sub-diffraction optical lithography
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Abstract
We show that after two-photon excitation of the photo initiator we are able to inhibit the polymerization process with a second beam of different wavelength. For achieving sub-diffraction resolution this is one of the key elements. Remarkably is that these experiments can be performed with a commercially available STED microscope slightly modified for two-photon-excitation (TPE). First experiments featuring an enhanced resolution will be presented.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Benjamin Harke, Paolo Bianchini, Fraz Anjum, Fernando Brandi, and Alberto Diaspro "Selective inhibition of polymerization enables sub-diffraction optical lithography", Proc. SPIE 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV, 792709 (8 February 2011); https://doi.org/10.1117/12.878961
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