Direct laser writing and applications of dielectric microstructures with low refractive index contrast

Vygantas Mizeikis; Vytautas Purlys; Lina Maigyte; Kestutis Staliunas; Saulius Juodkazis

doi:10.1117/12.875951

11 February 2011 Direct laser writing and applications of dielectric microstructures with low refractive index contrast

Vygantas Mizeikis, Vytautas Purlys, Lina Maigyte, Kestutis Staliunas, Saulius Juodkazis

Proceedings Volume 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV; 79270F (2011) https://doi.org/10.1117/12.875951
Event: SPIE MOEMS-MEMS, 2011, San Francisco, California, United States

Abstract

High versatility of direct laser write (DLW) technique makes it ideally suited for fabrication of 3D micro- and nano-structures with complex lattice topologies. However, DLW typically exploits irreversible photomodification of materials, for example optical breakdown or photopolymerization. Here we describe application of DLW technique for structuring of iron-doped lithium niobate (LiNbO₃:Fe) crystals. This approach exploits reversible photomodification resulting in low refractive index modulation (~10^-3) via photorefractive effect. We demonstrate formation of meta-stable, optically reconfigurable structures that can be erased or re-written without permanent optical damage to the host crystal. All-optical recording-erasure cycle may allow realization of dynamically modifiable photonic microstructures, such as waveguides, diffractive elements and optical memories.

Citation Download Citation

Vygantas Mizeikis, Vytautas Purlys, Lina Maigyte, Kestutis Staliunas, and Saulius Juodkazis "Direct laser writing and applications of dielectric microstructures with low refractive index contrast", Proc. SPIE 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV, 79270F (11 February 2011); https://doi.org/10.1117/12.875951

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