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14 February 2011 Characterization of MEMS FTIR spectrometer
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Proceedings Volume 7930, MOEMS and Miniaturized Systems X; 79300J (2011) https://doi.org/10.1117/12.876124
Event: SPIE MOEMS-MEMS, 2011, San Francisco, California, United States
Abstract
In this work we present the full characterization of an optical MEMS Fourier Transform Infra Red FTIR spectrometer fabricated by Deep Reactive Ion Etching DRIE Technology on Silicon substrate. Both electrical and optical properties of the spectrometer are measured. The presented techniques allows to build an engineering model for the spectrometer and to predict its main specifications taking into account the specificity of the MEMS technology used in the spectrometer fabrication.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Diaa Khalil, Yasser Sabry, Haitham Omran, Mostafa Medhat, Amr Hafez, and Bassam Saadany "Characterization of MEMS FTIR spectrometer", Proc. SPIE 7930, MOEMS and Miniaturized Systems X, 79300J (14 February 2011); https://doi.org/10.1117/12.876124
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