Glass imprint process for optical device fabrication

Naoyuki Kitamura; Kohei Fukumi; Junji Nishii

doi:10.1117/12.876806

23 February 2011 Glass imprint process for optical device fabrication

Naoyuki Kitamura, Kohei Fukumi, Junji Nishii

Proceedings Volume 7934, Optical Components and Materials VIII; 79340M (2011) https://doi.org/10.1117/12.876806
Event: SPIE OPTO, 2011, San Francisco, California, United States

Abstract

An antireflective two-dimensional subwavelength structure and a one-dimensional periodic structure with large phase retardation were fabricated on the glass surfaces by glass-imprint process. Novel low-Tg optical glasses based on bismuth phosphate and bismuth borate systems have been developed for the fabrication of these structures. These glasses had refractive indexes higher than 1.8 and deformation temperatures lower than 500 °C. Antireflective structure optimized by rigorous coupled-wave analysis was fabricated on an SiC mold having a curved surface for lens formation by using electron-beam lithography and dry etching techniques. Reflectivity at the imprinted surface relief decreased to about one-tens as compared with that at the polished surface in the visible region, and had less dependence on incident angle and wavelength. Mold shape has been optimized to fabricate one-dimensional structure with a high aspect ratio. A phase retardation of 0.23λ was observed between TE- and TM-polarized beams at 400 nm in the glass plate on both the surfaces of which one-dimensional structures were fabricated.

Citation Download Citation

Naoyuki Kitamura, Kohei Fukumi, and Junji Nishii "Glass imprint process for optical device fabrication", Proc. SPIE 7934, Optical Components and Materials VIII, 79340M (23 February 2011); https://doi.org/10.1117/12.876806

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