Surface enhanced Raman radiation of crystal violet dye with a SiO2 buffer

Tung-Kai Liu; Wen-Chi Hung; Ming-Shan Tsai; Chia-Ling Lo; Yu-Sung Lin; Chie-Tong Kuo; I-Min Jiang

doi:10.1117/12.874755

1 March 2011 Surface enhanced Raman radiation of crystal violet dye with a SiO₂ buffer

Tung-Kai Liu, Wen-Chi Hung, Ming-Shan Tsai, Chia-Ling Lo, Yu-Sung Lin, Chie-Tong Kuo, I-Min Jiang

Proceedings Volume 7947, Quantum Dots and Nanostructures: Synthesis, Characterization, and Modeling VIII; 79470W (2011) https://doi.org/10.1117/12.874755
Event: SPIE OPTO, 2011, San Francisco, California, United States

Abstract

Surface enhanced Raman radiation of crystal violet dye has been studied by modulating the localized surface plasmon effect of silver nanoparticles. In the experiment, a buffer layer of silicon dioxide (SiO₂) was established between crystal violet dye and silver nanoparticles. With a probe of laser beam of 532 nm in wavelength, it was found that the intensity of the Raman scattering significantly depended on the thickness of SiO₂ layer. A maximum Raman-radiation intensity occurred with a 10nm-thicked SiO₂ layer. The experimental observation shows a possible modulation of surface enhanced Raman radiation by a proper dielectric buffer.

Citation Download Citation

Tung-Kai Liu, Wen-Chi Hung, Ming-Shan Tsai, Chia-Ling Lo, Yu-Sung Lin, Chie-Tong Kuo, and I-Min Jiang "Surface enhanced Raman radiation of crystal violet dye with a SiO₂ buffer", Proc. SPIE 7947, Quantum Dots and Nanostructures: Synthesis, Characterization, and Modeling VIII, 79470W (1 March 2011); https://doi.org/10.1117/12.874755

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