Modeling the transfer of line edge roughness from an EUV mask to the wafer

Gregg M. Gallatin; Patrick P. Naulleau

doi:10.1117/12.881641

26 March 2011 Modeling the transfer of line edge roughness from an EUV mask to the wafer

Gregg M. Gallatin, Patrick P. Naulleau

Proceedings Volume 7969, Extreme Ultraviolet (EUV) Lithography II; 796903 (2011) https://doi.org/10.1117/12.881641
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

Contributions to line edge roughness (LER) from extreme ultraviolet (EUV) masks have recently been shown to be an issue of concern for both the accuracy of current resist evaluation tests as well the ultimate LER requirements for the 22 nm production node. More recently, it has been shown that the power spectral density of the mask-induced roughness is markedly different than that of intrinsic resist roughness and thus potentially serves as a mechanism for distinguishing mask effects from resist effects in experimental results. But the evaluation of stochastic effects in the resist itself demonstrate that such a test would only be viable in cases where the resist effects are completely negligible in terms of their contribution to the total LER compared to the mask effects. Also the results presented here lead us to the surprising conclusion that it is indeed possible for mask contributors to be the dominant source of LER while the spatial characteristics of the LER remain indistinguishable from the fractal characteristics of resist-induced LER.

Citation Download Citation

Gregg M. Gallatin and Patrick P. Naulleau "Modeling the transfer of line edge roughness from an EUV mask to the wafer", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 796903 (26 March 2011); https://doi.org/10.1117/12.881641

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available