Translator Disclaimer
5 April 2011 AIMS EUV: the actinic aerial image review platform for EUV masks
Author Affiliations +
EUV mask infrastructure is of key importance for the introduction of the 13.5nm extreme ultraviolet (EUV) wavelength into volume production. In particular, the manufacturing of defect free masks is essential and requires a printability analysis ("review") of potential defect sites. For this purpose, Carl Zeiss and the SEMATECH EUVL Mask Infrastructure consortium have performed a concept and feasibility study for an actinic aerial image metrology system (AIMS™). In this paper, we discuss the main results of this study. We explain the system concept, discuss the expected performance and show simulations of the capability to find minimum sized defects. We demonstrate that our EUV AIMS concept is technically feasible and supports the defect review requirements for the 22nm and 16nm half-pitch (hp) node.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dirk Hellweg, Johannes Ruoff, Alois Herkommer, Joachim Stühler, Thomas Ihl, Heiko Feldmann, Michael Ringel, Ulrich Strößner, Sascha Perlitz, and Wolfgang Harnisch "AIMS EUV: the actinic aerial image review platform for EUV masks", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79690H (5 April 2011);


EUV lithography optics for sub-9nm resolution
Proceedings of SPIE (March 16 2015)
The future of EUV lithography enabling Moore's Law in...
Proceedings of SPIE (March 27 2017)
Alternative reticles for low-k1 EUV imaging
Proceedings of SPIE (September 26 2019)
Nikon EUVL development progress update
Proceedings of SPIE (March 26 2008)

Back to Top