LPP source system development for HVM

David C. Brandt; Igor V. Fomenkov; Alex I. Ershov; William N. Partlo; David W. Myers; Richard L. Sandstrom; Bruno M. La Fontaine; Michael J. Lercel; Alexander N. Bykanov; Norbert R. Böwering; Georgiy O. Vaschenko; Oleh V. Khodykin; Shailendra N. Srivastava; Imtiaz Ahmad; Chirag Rajyaguru; Palash Das; Vladimir B. Fleurov; Kevin Zhang; Daniel J. Golich; Silvia De Dea; Richard R. Hou; Wayne J. Dunstan; Christian J. Wittak; Peter Baumgart; Toshihiko Ishihara; Rod D. Simmons; Robert N. Jacques; Robert A. Bergstedt

doi:10.1117/12.882208

7 April 2011 LPP source system development for HVM

David C. Brandt, Igor V. Fomenkov, Alex I. Ershov, William N. Partlo, David W. Myers, Richard L. Sandstrom, Bruno M. La Fontaine, Michael J. Lercel, Alexander N. Bykanov, Norbert R. Böwering, Georgiy O. Vaschenko, Oleh V. Khodykin, Shailendra N. Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Palash Das, Vladimir B. Fleurov, Kevin Zhang, Daniel J. Golich, Silvia De Dea, Richard R. Hou, Wayne J. Dunstan, Christian J. Wittak, Peter Baumgart, Toshihiko Ishihara, Rod D. Simmons, Robert N. Jacques, Robert A. Bergstedt

Author Affiliations +

Proceedings Volume 7969, Extreme Ultraviolet (EUV) Lithography II; 79691H (2011) https://doi.org/10.1117/12.882208
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

Laser produced plasma (LPP) systems have been developed as a viable approach for the EUV scanner light sources to support optical imaging of circuit features at sub-22nm nodes on the ITRS roadmap. This paper provides a review of development progress and productization status for LPP extreme-ultra-violet (EUV) sources with performance goals targeted to meet specific requirements from leading scanner manufacturers. The status of first generation High Volume Manufacturing (HVM) sources in production and at a leading semiconductor device manufacturer is discussed. The EUV power at intermediate focus is discussed and the lastest data are presented. An electricity consumption model is described, and our current product roadmap is shown.

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David C. Brandt, Igor V. Fomenkov, Alex I. Ershov, William N. Partlo, David W. Myers, Richard L. Sandstrom, Bruno M. La Fontaine, Michael J. Lercel, Alexander N. Bykanov, Norbert R. Böwering, Georgiy O. Vaschenko, Oleh V. Khodykin, Shailendra N. Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Palash Das, Vladimir B. Fleurov, Kevin Zhang, Daniel J. Golich, Silvia De Dea, Richard R. Hou, Wayne J. Dunstan, Christian J. Wittak, Peter Baumgart, Toshihiko Ishihara, Rod D. Simmons, Robert N. Jacques, and Robert A. Bergstedt "LPP source system development for HVM", Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79691H (7 April 2011); https://doi.org/10.1117/12.882208

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