Wafer-level fabrication of distributed feedback laser diodes by utilizing UV nanoimprint lithography

Masaki Yanagisawa; Yukihiro Tsuji; Hiroyuki Yoshinaga; Naoya Kouno; Kenji Hiratsuka

doi:10.1117/12.879367

4 April 2011 Wafer-level fabrication of distributed feedback laser diodes by utilizing UV nanoimprint lithography

Masaki Yanagisawa, Yukihiro Tsuji, Hiroyuki Yoshinaga, Naoya Kouno, Kenji Hiratsuka

Proceedings Volume 7970, Alternative Lithographic Technologies III; 797014 (2011) https://doi.org/10.1117/12.879367
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

The authors have succeeded in employing nanoimprint lithography (NIL) to form diffraction gratings of distributed feedback laser diodes (DFB LDs) used in optical communication. We have fabricated more than 300 phase-shifted DFB LDs on a 2-in. InP substrate. The devices have indicated comparable characteristics including uniformity and reliability with those fabricated by conventional electron beam lithography. We have also demonstrated a novel concept of a mold containing various types of grating patterns in a field ("VARI-mold"). By utilizing the new mold, DFB LDs with various emission wavelengths are formed simultaneously on a wafer. It indicates that one VARI-mold is possible to be applied to various kinds of product, leading to the cost reduction of the molds and the total NIL process. The results of this study indicate that NIL is a promising candidate of the production technique for phase-shifted DFB LDs featuring low cost and high throughput.

Citation Download Citation

Masaki Yanagisawa, Yukihiro Tsuji, Hiroyuki Yoshinaga, Naoya Kouno, and Kenji Hiratsuka "Wafer-level fabrication of distributed feedback laser diodes by utilizing UV nanoimprint lithography", Proc. SPIE 7970, Alternative Lithographic Technologies III, 797014 (4 April 2011); https://doi.org/10.1117/12.879367

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